Photomask Lithography Engineer

Job description: The Photomask Lithography Engineer will serve as a key technical contributor supporting lithography direct write systems for photomask manufacturing (JEOL JBX, Nu. Flare EBM, ALTA iLIne/DUV, or Mycronic SLX). As part of the Lithography Engineering team, this role is responsible for daily process sustaining, defining equipment PMs/needs, new tool qualification, and development to optimize performance.

The engineer will work closely with operations, technical development teams, and vendors to ensure robust process integration and to continuously improve yield, cycle time, and overall product quality. Education/Experience Requirements Bachelor's degree in Engineering, Physics, Chemistry, or a related technical field.

3+ years of experience in direct write lithography or semiconductor equipment engineering, ideally with JEOL JBX, Nu. Flare EBM, ALTA iLIne/DUV, or Mycronic SLX tools. Strong understanding of lithography fundamentals, photomask process flows, beam control, dose optimization, and pattern fidelity. Hands on equipment ownership experience, including troubleshooting, PM optimization, FDC use, FMEA, vacuum diagnostics, and system stability management.

Proficiency in SPC, DOE, OCAPs, process windows, and statistical data analysis using JMP, Excel, or similar tools. Basic scripting or programming skills (Python, VBA, SQL, C++, etc.) for automation and data insights. Strong analytical and problem‑solving capability using structured methods (5 Whys, MBPS, 8D, Ishikawa).

Demonstrated results in yield improvement, defect reduction, and continuous improvement initiatives; Lean Six Sigma preferred. Excellent communication and documentation skills with the ability to collaborate across operations, metrology, inspection, and engineering teams. Strong organizational skills, attention to detail, and the ability to manage multiple priorities in a high‑volume manufacturing environment.